Microchips are made by building up complex patterns of transistors, layer by layer, on a silicon wafer. ASML's lithography systems are central to that process. Light is projected through a blueprint. In this paper, we present key technology challenges faced when using optical lithography for silicon photonics and advantages of using the 193nm immersion lithography system. We report successful demonstration of a modified 28nm-STI-like patterning platform for silicon photonics in 300mm. Precise curved geometries are vital to making silicon photonics technology work A photonic IC (PIC) is a device that integrates multiple functions. The best-known example of a PIC is a fiber-optic communications system where data is transmitted through light waves rather than electrical signals. At its core, it relies on photomasks, precision templates that carry the circuit patterns, to expose a photosensitive. Lithography is the process used to transfer circuit patterns onto silicon wafers during chip manufacturing.
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